Invention Grant
- Patent Title: Exposure control system and associated exposure control method
- Patent Title (中): 曝光控制系统及相关曝光控制方法
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Application No.: US14873711Application Date: 2015-10-02
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Publication No.: US09554059B1Publication Date: 2017-01-24
- Inventor: Chin-An Lin , Chung-Te Li , Keng-Sheng Lin , Hao-Jen Wang , Hsin-Yu Chen
- Applicant: Quanta Computer Inc.
- Applicant Address: TW Guishan Dist., Taoyuan
- Assignee: QUANTA COMPUTER INC.
- Current Assignee: QUANTA COMPUTER INC.
- Current Assignee Address: TW Guishan Dist., Taoyuan
- Agency: McClure, Qualey & Rodack, LLP
- Priority: TW104124856A 20150731
- Main IPC: H04N5/235
- IPC: H04N5/235 ; H04N5/335 ; H04N5/355

Abstract:
An exposure-control system and an associated exposure control method are provided. The exposure-control system includes: an image capturing unit configured to capture a long-exposure image and a short-exposure image with a first exposure value and a second exposure value, respectively; and a processor, configured to calculate histograms of the long-exposure image and the short-exposure image, and calculate an exposure ratio according to the calculated histograms, the first and second exposure values, wherein when the exposure ratio is smaller than a first threshold, the processor switches a current exposure mode to a low dynamic range mode. When the exposure ratio is larger than a second threshold, the processor switches the current exposure mode to a high dynamic range mode. When the exposure ratio is between the first threshold and the second threshold, the processor does not switch the current exposure mode.
Public/Granted literature
- US20170034413A1 EXPOSURE CONTROL SYSTEM AND ASSOCIATED EXPOSURE CONTROL METHOD Public/Granted day:2017-02-02
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