Invention Grant
- Patent Title: Vapour deposition
- Patent Title (中): 气相沉积
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Application No.: US13885593Application Date: 2011-11-21
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Publication No.: US09556509B2Publication Date: 2017-01-31
- Inventor: Ricardo Mikalo , Jens Dienelt
- Applicant: Ricardo Mikalo , Jens Dienelt
- Applicant Address: GB Cambridge
- Assignee: FLEXENABLE LIMITED
- Current Assignee: FLEXENABLE LIMITED
- Current Assignee Address: GB Cambridge
- Agency: Sughrue Mion, PLLC
- Priority: GB1019727.5 20101122
- International Application: PCT/EP2011/070523 WO 20111121
- International Announcement: WO2012/069395 WO 20120531
- Main IPC: C23C14/00
- IPC: C23C14/00 ; C23C14/34 ; H01J37/34

Abstract:
A method, comprising: generating a vapor of a material from a source of said material comprising a plurality of separate solid pieces of said material supported on a surface of a base in a configuration in which said plurality of solid pieces of said target material are arranged at two or more levels to cover the whole of said surface of said base while providing a gap between adjacent pieces at the same level; and depositing said material from said vapor onto a substrate.
Public/Granted literature
- US20130277204A1 VAPOUR DEPOSITION Public/Granted day:2013-10-24
Information query
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