Invention Grant
US09558914B2 Bipolar wafer charge monitor system and ion implantation system comprising same
有权
双极晶片电荷监测系统和包括其的离子注入系统
- Patent Title: Bipolar wafer charge monitor system and ion implantation system comprising same
- Patent Title (中): 双极晶片电荷监测系统和包括其的离子注入系统
-
Application No.: US14631066Application Date: 2015-02-25
-
Publication No.: US09558914B2Publication Date: 2017-01-31
- Inventor: Marvin Farley , Takao Sakase , Joseph Foley
- Applicant: Axcelis Technologies, Inc.
- Applicant Address: US MA Beverly
- Assignee: AXCELIS TECHNOLOGIES, INC.
- Current Assignee: AXCELIS TECHNOLOGIES, INC.
- Current Assignee Address: US MA Beverly
- Agency: Eschweiler & Associates, LLC
- Main IPC: H01J37/08
- IPC: H01J37/08 ; H01J37/304 ; H01J37/317 ; H01J37/32

Abstract:
A charge monitor having a Langmuir probe is provided, wherein a positive and negative charge rectifier are operably coupled to the probe and configured to pass only a positive and negative charges therethrough, respectively. A positive current integrator is operably coupled to the positive charge rectifier, wherein the positive current integrator is biased via a positive threshold voltage, and wherein the positive current integrator is configured to output a positive dosage based, at least in part, on the positive threshold voltage. A negative current integrator is operably coupled to the negative charge rectifier, wherein the negative current integrator is biased via a negative threshold voltage, and wherein the negative current integrator is configured to output a negative dosage based, at least in part, on the negative threshold voltage. A positive charge counter and a negative charge counter are configured to respectively receive the output from the positive current integrator and negative current integrator in order to provide a respective cumulative positive charge value and cumulative negative charge value associated with the respective positive charge and negative charge.
Public/Granted literature
- US20160247664A1 BIPOLAR WAFER CHARGE MONITOR SYSTEM AND ION IMPLANTATION SYSTEM COMPRISING SAME Public/Granted day:2016-08-25
Information query