发明授权
- 专利标题: Electrodeposited copper foil
- 专利标题(中): 电沉积铜箔
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申请号: US14486107申请日: 2014-09-15
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公开(公告)号: US09562298B2公开(公告)日: 2017-02-07
- 发明人: Jui-Chang Chou , Kuei-Sen Cheng , Yao-Sheng Lai , Hsi-Hsing Lo , Yueh-Min Liu
- 申请人: Chang Chun Petrochemical Co., Ltd.
- 申请人地址: TW Taipei
- 专利权人: Chang Chun Petrochemical Co., Ltd.
- 当前专利权人: Chang Chun Petrochemical Co., Ltd.
- 当前专利权人地址: TW Taipei
- 代理机构: Polsinelli PC
- 优先权: TW103110616A 20140321
- 主分类号: B21C37/00
- IPC分类号: B21C37/00 ; C25D1/04 ; C25D3/38
摘要:
An electrodeposited copper foil having a texture coefficient of a plane (200) from 50 to 80%, based on the sum of the texture coefficients of a plane (111), the plane (200), a plane (220) and a plane (200) of the electrodeposited copper foil is provided. The electrodeposited copper foil is particularly suitable for use in the applications in printed circuit boards and lithium ion secondary batteries.
公开/授权文献
- US20150267313A1 ELECTRODEPOSITED COPPER FOIL 公开/授权日:2015-09-24
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