Invention Grant
- Patent Title: Multi-pressure MEMS package
- Patent Title (中): 多压MEMS封装
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Application No.: US14629738Application Date: 2015-02-24
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Publication No.: US09567210B2Publication Date: 2017-02-14
- Inventor: Chun-Wen Cheng , Chia-Hua Chu , Kuei-Sung Chang
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Associates, LLC
- Main IPC: B81B7/02
- IPC: B81B7/02 ; B81C1/00

Abstract:
The present disclosure relates to a microelectromechanical systems (MEMS) package having two MEMS devices with different pressures, and an associated method of formation. In some embodiments, the (MEMS) package includes a device substrate and a cap substrate bonded together. The bonded substrate comprises a first cavity corresponding to a first MEMS device having a first pressure and a second cavity corresponding to a second MEMS device having a different second pressure. The second cavity comprises a major volume and a vent hole connected by a lateral channel disposed between the device substrate and the cap substrate and the vent hole is hermetically sealed by a sealing structure.
Public/Granted literature
- US20160244325A1 MULTI-PRESSURE MEMS PACKAGE Public/Granted day:2016-08-25
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