Invention Grant
US09570344B2 Method to protect MOL metallization from hardmask strip process
有权
保护MOL金属化免受硬掩模剥离过程的方法
- Patent Title: Method to protect MOL metallization from hardmask strip process
- Patent Title (中): 保护MOL金属化免受硬掩模剥离过程的方法
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Application No.: US14752210Application Date: 2015-06-26
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Publication No.: US09570344B2Publication Date: 2017-02-14
- Inventor: Vimal Kamineni , Nicholas Vincent Licausi , Shariq Siddiqui , Jeremy Austin Wahl
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Heslin Rothenberg Farley and Mesiti PC
- Agent Nicholas Mesiti
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/768 ; H01L23/535
Abstract:
A method can include forming a contact trench in a semiconductor structure so that the contact trench extends to a contact formation, the forming including using a hardmask layer, and filling the contact trench with a sacrificial material layer, the sacrificial material layer formed over the contact formation. A semiconductor structure can include a sacrificial material layer over a contact formation.
Public/Granted literature
- US20160379872A1 METHOD TO PROTECT MOL METALLIZATION FROM HARDMASK STRIP PROCESS Public/Granted day:2016-12-29
Information query
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