Invention Grant
US09570539B2 Integration techniques for MIM or MIP capacitors with flash memory and/or high-κ metal gate CMOS technology
有权
具有闪存和/或高κ金属栅极CMOS技术的MIM或MIP电容器的集成技术
- Patent Title: Integration techniques for MIM or MIP capacitors with flash memory and/or high-κ metal gate CMOS technology
- Patent Title (中): 具有闪存和/或高κ金属栅极CMOS技术的MIM或MIP电容器的集成技术
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Application No.: US14851357Application Date: 2015-09-11
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Publication No.: US09570539B2Publication Date: 2017-02-14
- Inventor: Harry-Hak-Lay Chuang , Yu-Hsiung Wang , Chen-Chin Liu
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Associates, LLC
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L49/02 ; H01L27/115

Abstract:
Some embodiments of the present disclosure relate to an integrated circuit (IC) arranged on a semiconductor substrate, which includes a flash region, a capacitor region, and a logic region. An upper substrate surface of the capacitor region is recessed relative to respective upper substrate surfaces of the flash and logic regions, respectively. A capacitor, which includes a polysilicon bottom electrode, a conductive top electrode arranged over the polysilicon bottom electrode, and a capacitor dielectric separating the bottom and top electrodes; is disposed over the recessed upper substrate surface of the capacitor region. A flash memory cell is disposed over the upper substrate surface of the flash region. The flash memory cell includes a select gate having a planarized upper surface that is co-planar with a planarized upper surface of the top electrode of the capacitor.
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