Invention Grant
- Patent Title: Display device and manufacturing method thereof
- Patent Title (中): 显示装置及其制造方法
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Application No.: US15069043Application Date: 2016-03-14
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Publication No.: US09570616B2Publication Date: 2017-02-14
- Inventor: Yungbin Chung , Seungkyeng Cho , Chulhyun Baek , Injun Choi , Bogeon Jeon , Eunjeong Cho , Sunghoon Yang
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Gyeonggi-Do
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Gyeonggi-Do
- Agency: Cantor Colburn, LLP
- Priority: KR10-2015-0062679 20150504
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L23/29 ; H01L23/31 ; H01L27/32 ; H01L29/66 ; H01L21/02 ; H01L27/12 ; G02F1/1343 ; G02F1/1368 ; G02F1/1341

Abstract:
A display device includes: a first substrate; a gate electrode on the first substrate; a gate insulating layer on the gate electrode; a semiconductor layer on the gate insulating layer; a source electrode and a drain electrode spaced apart from each other on the semiconductor layer; a first passivation layer including a silicon nitride-based material and on the semiconductor layer, the source electrode, and the drain electrode; a second passivation layer including a silicon nitride-based material and on the first passivation layer; and a third passivation layer including a silicon nitride-based material and on the second passivation layer, where a content ratio of silicon in the first passivation layer is higher than a content ratio of silicon in the second passivation layer, and the content ratio of silicon in the second passivation layer is higher than a content ratio of silicon in the third passivation layer.
Public/Granted literature
- US20160329430A1 DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2016-11-10
Information query
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