Invention Grant
US09583371B2 Electrostatic chuck and apparatus for processing a substrate including the same 有权
静电吸盘和用于处理包含该衬底的衬底的设备

Electrostatic chuck and apparatus for processing a substrate including the same
Abstract:
An ESC may include a dielectric layer, an electrode, a pedestal, a heater, an adhesive and a protecting ring. The dielectric layer may be configured to support a substrate. The electrode may be disposed in the dielectric layer and is configured to form plasma over the substrate. The pedestal may be disposed under the dielectric layer. The heater may be disposed between the pedestal and the dielectric layer and is configured to heat the substrate. The adhesive may be disposed between the pedestal and the heater, and between the heater and the dielectric layer. The protecting ring may be configured to surround the adhesive. The protecting ring may include a plasma-resistant material.
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