Invention Grant
US09586207B2 Etching method for forming a carrier having inward side walls in particular for confining a droplet for capillary self-assembly 有权
用于形成具有向内侧壁的载体的蚀刻方法,特别是用于限制用于毛细管自组装的液滴

Etching method for forming a carrier having inward side walls in particular for confining a droplet for capillary self-assembly
Abstract:
A method for capillary self-assembly of a plate and a carrier, including: forming an etching mask on a region of a substrate; reactive-ion etching the substrate, the etching using a series of cycles each including isotropic etching followed by surface passivation, wherein a duration of the isotropic etching for each cycle increases from one cycle to another, a ratio between durations of the passivation and etching of each cycle is lower than a ratio for carrying out a vertical anisotropic etching to form a carrier having an upper surface defined by the region and side walls defining an acute angle with the upper surface; removing the etching mask; placing a droplet on the upper surface of the carrier; and placing the plate on the droplet.
Information query
Patent Agency Ranking
0/0