Invention Grant
US09586826B2 Method of growing high-quality single layer graphene by using Cu/Ni multi-layer metalic catalyst, and graphene device using the same
有权
使用Cu / Ni多层金属催化剂生长高质量单层石墨烯的方法,以及使用其的石墨烯装置
- Patent Title: Method of growing high-quality single layer graphene by using Cu/Ni multi-layer metalic catalyst, and graphene device using the same
- Patent Title (中): 使用Cu / Ni多层金属催化剂生长高质量单层石墨烯的方法,以及使用其的石墨烯装置
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Application No.: US14314153Application Date: 2014-06-25
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Publication No.: US09586826B2Publication Date: 2017-03-07
- Inventor: Jin Sik Choi , Hong Kyw Choi , Ki Chul Kim , Young Jun Yu , Jin Soo Kim , Choon Gi Choi
- Applicant: Electronics and Telecommunications Research Institute
- Applicant Address: KR Daejeon
- Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Current Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Current Assignee Address: KR Daejeon
- Agency: Rabin & Berdo, P.C.
- Priority: KR10-2014-0002973 20140109
- Main IPC: C01B31/04
- IPC: C01B31/04 ; H01L21/04

Abstract:
Disclosed are a method of growing a high-quality single layer graphene by using a Cu/Ni multi-layer metallic catalyst, and a graphene device using the same. The method controls and grows a high-quality single layer graphene by using the Cu/Ni multilayer metallic catalyst, in which a thickness of a nickel lower layer is fixed and a thickness of a copper upper layer is changed in a case where a graphene is grown by a CVD method. According to the method, it is possible to obtain a high-quality single layer graphene, and improve performance of a graphene application device by utilizing the high-quality single layer graphene and thus highly contribute to industrialization of the graphene application device.
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