Invention Grant
US09589801B2 Methods for wafer bonding and for nucleating bonding nanophases using wet and steam pressurization 有权
使用湿和蒸汽加压的晶圆接合和成核结合纳米相的方法

Methods for wafer bonding and for nucleating bonding nanophases using wet and steam pressurization
Abstract:
Substrates may be bonded according to a method comprising contacting a first bonding surface of a first substrate with a second bonding surface of a second substrate to form an assembly in the presence of an steam atmosphere under suitable conditions to form a bonding layer between the first and second surfaces, wherein the first bonding surface comprises a polarized surface layer; the second bonding surface comprises a hydrophilic surface layer; the first and second bonding surfaces are different.
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