Invention Grant
- Patent Title: Semiconductor wafer
- Patent Title (中): 半导体晶圆
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Application No.: US14672811Application Date: 2015-03-30
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Publication No.: US09589902B2Publication Date: 2017-03-07
- Inventor: Yasunobu Matsumoto , Masaki Suzuki , Makoto Asou , Hiroshi Morita
- Applicant: SEIKO INSTRUMENTS INC.
- Applicant Address: JP
- Assignee: SII Semiconductor Corporation
- Current Assignee: SII Semiconductor Corporation
- Current Assignee Address: JP
- Agency: Adams & Wilks
- Priority: JP2014-075029 20140401
- Main IPC: H01L23/544
- IPC: H01L23/544 ; H01L25/18

Abstract:
A semiconductor wafer has formed thereon various types of semiconductor chips and enables different types of semiconductor chips having the same chip size to be easily distinguished. An excluded region is formed on an outer periphery of the semiconductor wafer, and a region inside the excluded region is divided into different types of regions by boundaries. Mark chips are respectively arranged in the vicinity of both ends of the boundaries.
Public/Granted literature
- US20150279786A1 SEMICONDUCTOR WAFER Public/Granted day:2015-10-01
Information query
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