发明授权
US09594306B2 Lithographic apparatus, spectral purity filter and device manufacturing method
有权
平版印刷设备，光谱纯度滤光片和器件制造方法
- 专利标题： Lithographic apparatus, spectral purity filter and device manufacturing method
- 专利标题（中）： 平版印刷设备，光谱纯度滤光片和器件制造方法
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申请号： US14002000申请日： 2011-12-21
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公开(公告)号： US09594306B2公开(公告)日： 2017-03-14
- 发明人: Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
- 申请人： Vadim Yevgenyevich Banine , Wilhelmus Petrus De Boeij , Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 国际申请： PCT/EP2011/073537 WO 20111221
- 国际公布： WO2012/119672 WO 20120913
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; B82Y10/00 ; G21K1/06 ; H05G2/00
摘要：
A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
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