Invention Grant
- Patent Title: Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
- Patent Title (中): 检测方法和装置，光刻设备，光刻处理单元和器件制造方法
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Application No.: US14335702Application Date: 2014-07-18
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Publication No.: US09594310B2Publication Date: 2017-03-14
- Inventor: Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar , Andreas Fuchs , Martyn John Coogans
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03F7/20 ; G01N21/47 ; G01N21/95 ; G01N21/956 ; G03F9/00
Abstract:
The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured. The intensity of each of the first diffraction orders from the diffraction spectrum are compared to determine overlay (or other properties) of exposed layers on the substrate.
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