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公开(公告)号：US09594311B2
公开(公告)日：2017-03-14
申请号：US14335711
申请日：2014-07-18
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar , Andreas Fuchs , Martyn John Coogans
CPC classification number: G03F7/7065 , G01N21/47 , G01N21/4788 , G01N21/9501 , G01N21/956 , G03F7/70633 , G03F9/7049 , G03F9/7088
Abstract: The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured. The intensity of each of the first diffraction orders from the diffraction spectrum are compared to determine overlay (or other properties) of exposed layers on the substrate.
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2.发明授权Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权检测方法和装置，光刻设备，光刻处理单元和器件制造方法公开(公告)号：US09594310B2
公开(公告)日：2017-03-14
申请号：US14335702
申请日：2014-07-18
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar , Andreas Fuchs , Martyn John Coogans
CPC classification number: G03F7/7065 , G01N21/47 , G01N21/4788 , G01N21/9501 , G01N21/956 , G03F7/70633 , G03F9/7049 , G03F9/7088
Abstract: The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured. The intensity of each of the first diffraction orders from the diffraction spectrum are compared to determine overlay (or other properties) of exposed layers on the substrate.
Abstract translation: 本发明使用在图像平面内或附近测量衍射光谱，以便确定曝光的基底的性质。 特别地，正和负的第一衍射级被分离或分离，检测并测量它们的强度。 比较来自衍射光谱的每个第一衍射级的强度，以确定衬底上的暴露层的覆盖（或其它性质）。
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3.发明申请公开(公告)号：US20130135600A1
公开(公告)日：2013-05-30
申请号：US13667174
申请日：2012-11-02
Applicant: ASML Netherlands B.V.
Inventor： Scott Anderson MIDDLEBROOKS , Rene Andreas Maria Pluijms , Martyn John Coogans , Marc Johannes Noot
IPC: G03B27/54
CPC classification number: G03F7/70625 , G03F7/70525 , G03F7/70641
Abstract: An inspection method, and corresponding apparatus, enables classification of pupil images according to a process variable. The method comprises acquiring diffraction pupil images of a plurality of structures formed on a substrate during a lithographic process. A process variable of the lithographic process varies between formation of the structures, the variation of the process variable resulting in a variation in the diffraction pupil images. The method further comprises determining at least one discriminant function for the diffraction pupil images, the discriminant function being able to classify the pupil images in terms of the process variable.
Abstract translation: 检查方法和相应的装置能够根据过程变量分类瞳孔图像。 该方法包括在光刻工艺期间获取在基板上形成的多个结构的衍射光瞳图像。 光刻过程的过程变量在结构的形成之间变化，过程变量的变化导致衍射光瞳图像的变化。 该方法还包括确定用于衍射光瞳图像的至少一个判别函数，判别函数能够根据过程变量对瞳孔图像进行分类。
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公开(公告)号：US10295913B2
公开(公告)日：2019-05-21
申请号：US13667174
申请日：2012-11-02
Applicant: ASML Netherlands B.V.
Inventor： Scott Anderson Middlebrooks , Rene Andreas Maria Pluijms , Martyn John Coogans , Marc Johannes Noot
IPC: G03F7/20
Abstract: An inspection method, and corresponding apparatus, enables classification of pupil images according to a process variable. The method comprises acquiring diffraction pupil images of a plurality of structures formed on a substrate during a lithographic process. A process variable of the lithographic process varies between formation of the structures, the variation of the process variable resulting in a variation in the diffraction pupil images. The method further comprises determining at least one discriminant function for the diffraction pupil images, the discriminant function being able to classify the pupil images in terms of the process variable.
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