Invention Grant
US09595695B2 Method for removing impurities from inside of vacuum chamber, method for using vacuum apparatus, and method for manufacturing product 有权
从真空室内除去杂质的方法,使用真空装置的方法及制造方法

  • Patent Title: Method for removing impurities from inside of vacuum chamber, method for using vacuum apparatus, and method for manufacturing product
  • Patent Title (中): 从真空室内除去杂质的方法,使用真空装置的方法及制造方法
  • Application No.: US14237928
    Application Date: 2013-06-06
  • Publication No.: US09595695B2
    Publication Date: 2017-03-14
  • Inventor: Yuko Kawanami
  • Applicant: JOLED INC.
  • Applicant Address: JP Tokyo
  • Assignee: JOLED INC.
  • Current Assignee: JOLED INC.
  • Current Assignee Address: JP Tokyo
  • Agency: Greenblum & Bernstein, P.L.C.
  • Priority: JP2012-133827 20120613
  • International Application: PCT/JP2013/003562 WO 20130606
  • International Announcement: WO2013/187026 WO 20131219
  • Main IPC: H01L51/56
  • IPC: H01L51/56 C23C14/56 H01L51/00 H01L51/50
Method for removing impurities from inside of vacuum chamber, method for using vacuum apparatus, and method for manufacturing product
Abstract:
A method for using a vacuum apparatus that includes a vacuum chamber and a pump, the vacuum chamber housing an object, the pump reducing an internal pressure of the vacuum chamber, the method including: ventilating inside the vacuum chamber by introducing a gas into the vacuum chamber and discharging the gas from the vacuum chamber by causing the pump to reduce the internal pressure of the vacuum chamber. In the ventilating, a discharge rate at which molecules of the gas per unit volume are discharged is at least 3.3×10−5 mol/(s·L), and the temperature in the vacuum chamber is at least 15° C. and at most 80° C.
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