Invention Grant
- Patent Title: Lithographic apparatus, drying device, metrology apparatus and device manufacturing method
-
Application No.: US14498883Application Date: 2014-09-26
-
Publication No.: US09606429B2Publication Date: 2017-03-28
- Inventor: Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Joost Jeroen Ottens , Marcel Beckers , Marco Polizzi , Michel Riepen , Anthonie Kuijper , Koen Steffens , Adrianes Johannes Baeten , Anca Mihaela Antonevici
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20 ; B01D19/00
Abstract:
An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
Public/Granted literature
- US20150015857A1 LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2015-01-15
Information query
