Invention Grant
- Patent Title: Lithographic apparatus and method of manufacturing a device
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Application No.: US14419425Application Date: 2013-07-30
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Publication No.: US09606445B2Publication Date: 2017-03-28
- Inventor: Vadim Yevgenyevich Banine , Arthur Winfried Eduardus Minnaert , Marcel Johannus Elisabeth Hubertus Muitjens , Andrei Mikhailovich Yakunin , Luigi Scaccabarozzi , Hans Joerg Mallmann , Kurstat Bal , Carlo Cornelis Maria Luijten , Han-Kwang Nienhuys , Alexander Marinus Arnoldus Huijberts , Paulus Albertus Maria Gasseling , Pedro Julian Rizo Diago , Maarten Van Kampen , Nicolaas Aldegonda Jan Maria Van Aerle
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2013/065947 WO 20130730
- International Announcement: WO2014/020003 WO 20140206
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G21K1/10

Abstract:
There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.
Public/Granted literature
- US20150192861A1 Lithographic Apparatus and Method of Manufacturing a Device Public/Granted day:2015-07-09
Information query
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