公开(公告)号：US20150192861A1

公开(公告)日：2015-07-09

申请号：US14419425

申请日：2013-07-30

Applicant: ASML Netherlands B.V.

Inventor： Vadim Yevgenyevich Banine ,  Arthur Winfried Eduardus Minnaert ,  Johannus Elisabeth Hubertus Muitjens ,  Andrei Mikhailovich Yakunin ,  Luigi Scaccabarozzi ,  Hans Joerg Mallmann ,  Kurstat Bal ,  Carlo Cornelis Maria Luijten ,  Han-Kwang Nienhuys ,  Alexander Marinus Arnoldus Huijberts ,  Paulus Albertus Maria Gasseling ,  Pedro Julian Rizo Diago ,  Maarten Van Kampen ,  Nicolaas Aldegonda Jan Maria Van Aerle

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/10

Abstract: There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.

Abstract translation: 公开了一种设置有光谱纯度滤光器的光刻设备，其可以设置在以下一个或多个位置：（a）在照明系统中，（b）与图案形成装置相邻，辐射束中的静态位置或 固定用于与图案形成装置一起运动，（c）在投影系统中，和（d）邻近衬底台。 光谱纯度滤光片优选为由多晶硅，多层材料，碳纳米管材料或石墨烯形成的膜。 膜可以设置有保护性盖层和/或薄金属透明层。

公开(公告)号：US09606445B2

公开(公告)日：2017-03-28

申请号：US14419425

申请日：2013-07-30

Applicant: ASML Netherlands B.V.

Inventor： Vadim Yevgenyevich Banine ,  Arthur Winfried Eduardus Minnaert ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Andrei Mikhailovich Yakunin ,  Luigi Scaccabarozzi ,  Hans Joerg Mallmann ,  Kurstat Bal ,  Carlo Cornelis Maria Luijten ,  Han-Kwang Nienhuys ,  Alexander Marinus Arnoldus Huijberts ,  Paulus Albertus Maria Gasseling ,  Pedro Julian Rizo Diago ,  Maarten Van Kampen ,  Nicolaas Aldegonda Jan Maria Van Aerle

IPC: G03F7/20 ,  G21K1/10

CPC classification number: G03F7/70191 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/10

Abstract: There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.