- 专利标题: Ultra thin radiation window and method for its manufacturing
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申请号: US13700791申请日: 2010-10-08
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公开(公告)号: US09607723B2公开(公告)日: 2017-03-28
- 发明人: Heikki Johannes Sipilä
- 申请人: Heikki Johannes Sipilä
- 申请人地址: FI Espoo
- 专利权人: HS FOILS OY
- 当前专利权人: HS FOILS OY
- 当前专利权人地址: FI Espoo
- 代理机构: Wood, Phillips, Katz, Clark & Mortimer
- 优先权: FI20105626 20100603
- 国际申请: PCT/FI2010/050781 WO 20101008
- 国际公布: WO2011/151505 WO 20111208
- 主分类号: H01J35/18
- IPC分类号: H01J35/18 ; G21K1/00 ; G21K1/02 ; H01J5/18 ; H01L31/028
摘要:
For manufacturing a radiation window for an X-ray measurement apparatus, and etch stop layer is first produced on a polished surface of a carrier. A thin film deposition technique is used to produce a structural layer on an opposite side of said etch stop layer than said carrier. The combined structure comprising said carrier, said etch stop layer, and said structural layer is attached to a region around an opening in a support structure with said structural layer facing said support structure. The carrier is etched away.
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