Invention Grant
- Patent Title: Sputtering system and method including an arc detection
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Application No.: US12174893Application Date: 2008-07-17
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Publication No.: US09613784B2Publication Date: 2017-04-04
- Inventor: Jesse N. Klein , David C. Halstead , Michael R. Gilbert
- Applicant: Jesse N. Klein , David C. Halstead , Michael R. Gilbert
- Applicant Address: US MA Andover
- Assignee: MKS Instruments, Inc.
- Current Assignee: MKS Instruments, Inc.
- Current Assignee Address: US MA Andover
- Agency: Harness, Dickey & Pierce, P.L.C.
- Main IPC: H01J37/34
- IPC: H01J37/34 ; H01J37/32

Abstract:
A sputtering system that includes a sputtering chamber having a target material serving as a cathode, and an anode and a work piece. A direct current (DC) power supply supplies electrical power to the anode and the cathode sufficient to generate a plasma within the sputtering chamber. A detection module detects the occurrence of an arc in the sputtering chamber by monitoring an electrical characteristic of the plasma. In one embodiment the electrical characteristic monitored is the impedance of the plasma. In another embodiment the electrical characteristic is the conductance of the plasma.
Public/Granted literature
- US20100012482A1 SPUTTERING SYSTEM AND METHOD INCLUDING AN ARC DETECTION Public/Granted day:2010-01-21
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