公开(公告)号：US20100012482A1

公开(公告)日：2010-01-21

申请号：US12174893

申请日：2008-07-17

Applicant: Jesse N. Klein ,  David C. Halstead ,  Michael R. Gilbert

Inventor： Jesse N. Klein ,  David C. Halstead ,  Michael R. Gilbert

IPC: C23C14/54

CPC classification number: H01J37/3476 ,  C23C14/54 ,  H01J37/32027 ,  H01J37/32055 ,  H01J37/32935 ,  H01J37/32944 ,  H01J37/34 ,  H01J37/3444 ,  H01J2237/0206

Abstract: A sputtering system that includes a sputtering chamber having a target material serving as a cathode, and an anode and a work piece. A direct current (DC) power supply supplies electrical power to the anode and the cathode sufficient to generate a plasma within the sputtering chamber. A detection module detects the occurrence of an arc in the sputtering chamber by monitoring an electrical characteristic of the plasma. In one embodiment the electrical characteristic monitored is the impedance of the plasma. In another embodiment the electrical characteristic is the conductance of the plasma.

Abstract translation: 一种溅射系统，其包括具有用作阴极的靶材料的溅射室，以及阳极和工件。 直流（DC）电源为阳极和阴极提供足以在溅射室内产生等离子体的电力。 检测模块通过监视等离子体的电特性来检测溅射室中的电弧的发生。 在一个实施例中，所监测的电特性是等离子体的阻抗。 在另一实施例中，电特性是等离子体的电导。

公开(公告)号：US09613784B2

公开(公告)日：2017-04-04

申请号：US12174893

申请日：2008-07-17

Applicant: Jesse N. Klein ,  David C. Halstead ,  Michael R. Gilbert

Inventor： Jesse N. Klein ,  David C. Halstead ,  Michael R. Gilbert

IPC: H01J37/34 ,  H01J37/32

CPC classification number: H01J37/3476 ,  C23C14/54 ,  H01J37/32027 ,  H01J37/32055 ,  H01J37/32935 ,  H01J37/32944 ,  H01J37/34 ,  H01J37/3444 ,  H01J2237/0206

Abstract: A sputtering system that includes a sputtering chamber having a target material serving as a cathode, and an anode and a work piece. A direct current (DC) power supply supplies electrical power to the anode and the cathode sufficient to generate a plasma within the sputtering chamber. A detection module detects the occurrence of an arc in the sputtering chamber by monitoring an electrical characteristic of the plasma. In one embodiment the electrical characteristic monitored is the impedance of the plasma. In another embodiment the electrical characteristic is the conductance of the plasma.

公开(公告)号：US06995570B2

公开(公告)日：2006-02-07

申请号：US10180273

申请日：2002-06-26

Applicant: David C. Halstead ,  Michael R. Gilbert

Inventor： David C. Halstead ,  Michael R. Gilbert

IPC: G01R31/02

CPC classification number: G01R31/024

Abstract: To provide protection for power supplies in which a plurality of paralleled identical DC power cables are provided between a source and a load, one aspect of the present invention provides a method for detecting conditions in parallel DC power cables. The method includes supplying current from a power supply to each of a plurality of DC power cables, determining an average current per cable flowing in the plurality of parallel DC power cables, comparing currents in each of the DC power cables with the determined average current, and signaling the existence of a condition in response to the comparison.

Abstract translation: 为了对在源和负载之间提供多个并联的相同DC电力电缆的电源提供保护，本发明的一个方面提供了一种用于检测并联DC电力电缆中的状况的方法。 该方法包括从多个DC电力电缆中的每一个电源电缆提供电流，确定在多个并联DC电力电缆中流动的每个电缆的平均电流，将每个DC电力电缆中的电流与确定的平均电流进行比较， 并且响应于比较来表明存在条件。