Invention Grant
- Patent Title: Method of acquiring EBSP patterns
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Application No.: US14834069Application Date: 2015-08-24
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Publication No.: US09618463B2Publication Date: 2017-04-11
- Inventor: Marek Un{hacek over (c)}ovský , Pavel Stejskal , Tomá{hacek over (s)} Vystav{hacek over (e)}l
- Applicant: FEI Company
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Associates, P.C.
- Agent Michael O. Scheinberg
- Priority: EP14182139 20140825
- Main IPC: H01J37/26
- IPC: H01J37/26 ; G01N23/203 ; H01J37/244 ; H01J37/252

Abstract:
The invention relates to a method of acquiring an Energy Backscattering Pattern image of a sample in a charged particle apparatus, the sample showing a flat surface, the charged particle apparatus equipped with an electron column for producing a finely focused electron beam, a position sensitive detector for detecting EBSP patterns, and a sample holder for holding and positioning the sample, the method comprising the steps of: Positioning the sample with respect to the electron beam, Directing the electron beam to an impact point on the sample, thereby causing backscattered electrons to irradiate the detector, and Acquiring the signal from the detector while the beam is kept stationary, in which The detector is equipped to selectively detect electrons with an energy above a predefined threshold, and The signal of the electrons with an energy above said threshold is used to form an EBSP image.
Public/Granted literature
- US20160054240A1 METHOD OF ACQUIRING EBSP PATTERNS Public/Granted day:2016-02-25
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