发明授权
- 专利标题: Tunnel field-effect transistor, method for manufacturing same, and switch element
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申请号: US14911609申请日: 2014-08-12
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公开(公告)号: US09634114B2公开(公告)日: 2017-04-25
- 发明人: Takashi Fukui , Katsuhiro Tomioka
- 申请人: NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY , JAPAN SCIENCE AND TECHNOLOGY AGENCY
- 申请人地址: JP Hakkaido JP Saitama
- 专利权人: National University Corporation Hakkaido University,Japan Science and Technology Agency
- 当前专利权人: National University Corporation Hakkaido University,Japan Science and Technology Agency
- 当前专利权人地址: JP Hakkaido JP Saitama
- 代理机构: Brundidge & Stanger, P.C.
- 优先权: JP2013-168048 20130813
- 国际申请: PCT/JP2014/004175 WO 20140812
- 国际公布: WO2015/022777 WO 20150219
- 主分类号: H01L29/06
- IPC分类号: H01L29/06 ; H01L29/66 ; H01L21/02 ; H01L29/04 ; H01L29/08 ; H01L29/40 ; B82Y10/00 ; H01L29/41 ; B82Y40/00
摘要:
A tunnel field-effect transistor (TFET) is configured by disposing a III-V compound semiconductor nano wire on a (111) plane of a IV semiconductor substrate exhibiting p-type conductivity, and arbitrarily disposing electrodes of a source, drain and gate. Alternatively, the tunnel field-effect transistor is configured by disposing a III-V compound semiconductor nano wire on a (111) plane of a IV semiconductor substrate exhibiting n-type conductivity, and arbitrarily disposing electrodes of a source, drain and gate. The nano wire is configured from a first region and a second region. For instance, the first region is intermittently doped with a p-type dopant, and the second region is doped with an n-type dopant.
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