Invention Grant
- Patent Title: Ion source and ion beam device using same
-
Application No.: US14351559Application Date: 2012-10-10
-
Publication No.: US09640360B2Publication Date: 2017-05-02
- Inventor: Hiroyasu Shichi , Shinichi Matsubara , Yoichi Ose , Yoshimi Kawanami , Noriaki Arai
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JP2011-224473 20111012
- International Application: PCT/JP2012/076161 WO 20121010
- International Announcement: WO2013/054799 WO 20130418
- Main IPC: H01J27/02
- IPC: H01J27/02 ; H01J37/08 ; H01J37/28 ; H01J37/26

Abstract:
Provided is a charged particle beam microscope which has a small mechanical vibration amplitude of a distal end of an emitter tip, is capable of obtaining an ultra-high resolution sample observation image and removing shaking or the like of the sample observation image. A gas field ion source includes: an emitter tip configured to generate ions; an emitter-base mount configured to support the emitter tip; a mechanism configured to heat the emitter tip; an extraction electrode installed to face the emitter tip; and a mechanism configured to supply a gas to the vicinity of the emitter tip, wherein the emitter tip heating mechanism is a mechanism of heating the emitter tip by electrically conducting a filament connecting at least two terminals, the terminals are connected by a V-shaped filament, an angle of the V shape is an obtuse angle, and the emitter tip is connected to a substantial center of the filament.
Public/Granted literature
- US20140299768A1 ION SOURCE AND ION BEAM DEVICE USING SAME Public/Granted day:2014-10-09
Information query