Thin film transistor array panel and manufacturing method thereof
Abstract:
Disclosed herein is a thin film transistor array panel, including: an insulating substrate; a gate electrode formed on the insulating substrate; a gate insulating layer formed on the gate electrode; a semiconductor layer formed on the gate insulating layer; a source electrode and a drain electrode formed on the semiconductor layer and the gate insulating layer and facing each other; and a pixel electrode connected to the drain electrode and applied with a voltage from the drain electrode, wherein a thickness of the gate insulating layer which overlaps the drain electrode but does not overlap the semiconductor layer is formed to be thinner than that which overlaps the semiconductor.
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