- 专利标题： Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers
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申请号： US13457383申请日： 2012-04-26
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公开(公告)号： US09651943B2公开(公告)日： 2017-05-16
- 发明人: Pavel Izikson , John Robinson , Mike Adel , Amir Widmann , Dongsub Choi , Anat Marchelli
- 申请人： Pavel Izikson , John Robinson , Mike Adel , Amir Widmann , Dongsub Choi , Anat Marchelli
- 申请人地址： US CA San Jose
- 专利权人： KLA-Tencor Corp.
- 当前专利权人： KLA-Tencor Corp.
- 当前专利权人地址： US CA San Jose
- 代理商 Ann Marie Mewherter
- 主分类号： H01L21/66
- IPC分类号： H01L21/66 ; G06F19/00 ; G05B21/02 ; G03F7/20
摘要：
Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one tot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process.
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