Invention Grant
- Patent Title: Method and layout of an integrated circuit
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Application No.: US14104730Application Date: 2013-12-12
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Publication No.: US09653393B2Publication Date: 2017-05-16
- Inventor: Wei-Yu Chen , Li-Chun Tien , Hui-Zhong Zhuang , Ting-Wei Chiang , Hsiang-Jen Tseng
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L23/522 ; G06F17/50 ; H01L23/528 ; H01L27/02 ; H01L27/118

Abstract:
An integrated circuit layout includes a first metal line, a second metal line, at least one first conductive via and a first conductive segment. The first metal line is formed along a first direction. The at least one first conductive via is disposed over the first metal line. The second metal line is disposed over at least one first conductive via and is in parallel with the first metal line. The first conductive segment is formed on one end of the second metal line.
Public/Granted literature
- US20150171005A1 Method and Layout of an Integrated Circuit Public/Granted day:2015-06-18
Information query
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