- Patent Title: Gas laser apparatus for determining composition ratio of laser gas
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Application No.: US15007653Application Date: 2016-01-27
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Publication No.: US09653876B2Publication Date: 2017-05-16
- Inventor: Kenichi Yuda , Tetsuhisa Takazane
- Applicant: FANUC CORPORATION
- Applicant Address: JP Yamanashi
- Assignee: Fanuc Corporation
- Current Assignee: Fanuc Corporation
- Current Assignee Address: JP Yamanashi
- Agency: RatnerPrestia
- Priority: JP2015-015609 20150129
- Main IPC: H01S3/097
- IPC: H01S3/097 ; H01S3/00 ; H01S3/036 ; H01S3/134 ; H01S3/223

Abstract:
A gas laser apparatus includes an actual laser output acquiring unit that acquires a first actual laser output at a predetermined laser output command after passage of a predetermined time from issuing of a first laser gas pressure command and acquires a second actual laser output at the predetermined laser output command after passage of the predetermined time from issuing of a second laser gas pressure command smaller than the first laser gas pressure command and a determining unit that determines whether the composition ratio of a laser gas in a gas container is normal or not by comparing the first actual laser output with a first reference output and comparing the second actual laser output with a second reference output smaller than the first reference output.
Public/Granted literature
- US20160226213A1 GAS LASER APPARATUS FOR DETERMINING COMPOSITION RATIO OF LASER GAS Public/Granted day:2016-08-04
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