Invention Grant
- Patent Title: Graphene layer, method of forming the same, device including graphene layer and method of manufacturing the device
-
Application No.: US14928026Application Date: 2015-10-30
-
Publication No.: US09660036B2Publication Date: 2017-05-23
- Inventor: Hyowon Kim , Jaeho Lee
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2014-0150628 20141031
- Main IPC: H01L29/16
- IPC: H01L29/16 ; H01L21/02 ; H01L29/66 ; C01B31/04 ; H01L51/00 ; H01L51/05

Abstract:
A graphene layer, a method of forming the graphene layer, a device including the graphene layer, and a method of manufacturing the device are provided. The method of forming the graphene layer may include forming a first graphene at a first temperature using a first source gas and forming a second graphene at a second temperature using a second source gas. One of the first and second graphenes may be a P-type graphene, and the other one of the first and second graphenes may be an N-type graphene. The first graphene and the second graphene together form a P—N junction.
Public/Granted literature
Information query
IPC分类: