Invention Grant
- Patent Title: Imprint lithography
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Application No.: US14222013Application Date: 2014-03-21
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Publication No.: US09662678B2Publication Date: 2017-05-30
- Inventor: Ivar Schram , Johan Frederik Dijksman , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: B44C1/22
- IPC: B44C1/22 ; B05D5/00 ; B82Y10/00 ; B82Y40/00 ; G03F7/00

Abstract:
A method of depositing an imprintable medium onto a target area of a substrate for imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction across the target area while ejecting a first series of droplets of imprintable medium onto the substrate and moving the substrate, the print head, or both, relative to the other in a second opposing direction across the target area while ejecting a second series of droplets of imprintable medium onto the substrate on or adjacent to droplets from the first series of droplets.
Public/Granted literature
- US20140199485A1 IMPRINT LITHOGRAPHY Public/Granted day:2014-07-17
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