公开(公告)号：US09889597B2

公开(公告)日：2018-02-13

申请号：US14076793

申请日：2013-11-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Yvonne Wendela Kruijt-Stegeman ,  Raymond Jacobus Wilhelmus Knaapen ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Ivar Schram ,  Raymond Wilhelmus Louis Lafarre

IPC: B29C59/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00 ,  B29C59/02

CPC classification number: B29C59/002 ,  B29C59/02 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.

公开(公告)号：US10654217B2

公开(公告)日：2020-05-19

申请号：US15865242

申请日：2018-01-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Yvonne Wendela Kruijt-Stegeman ,  Raymond Jacobus Wilhelmus Knaapen ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Ivar Schram ,  Raymond Wilhelmus Louis Lafarre

IPC: B29C59/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00 ,  B29C59/02

Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.

公开(公告)号：US20180162040A1

公开(公告)日：2018-06-14

申请号：US15865242

申请日：2018-01-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Yvonne Wendela Kruijt-Stegeman ,  Raymond Jacobus Wilhelmus Knaapen ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Ivar Schram ,  Raymond Wilhelmus Louis Lafarre

IPC: B29C59/00 ,  B29C59/02 ,  G03F7/00 ,  B82Y40/00 ,  B82Y10/00

CPC classification number: B29C59/002 ,  B29C59/02 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.

公开(公告)号：US09662678B2

公开(公告)日：2017-05-30

申请号：US14222013

申请日：2014-03-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Ivar Schram ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Jeroen Herman Lammers

IPC: B44C1/22 ,  B05D5/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00

CPC classification number: B05D5/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: A method of depositing an imprintable medium onto a target area of a substrate for imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction across the target area while ejecting a first series of droplets of imprintable medium onto the substrate and moving the substrate, the print head, or both, relative to the other in a second opposing direction across the target area while ejecting a second series of droplets of imprintable medium onto the substrate on or adjacent to droplets from the first series of droplets.