- 专利标题: Characterization of polymer and colloid solutions
-
申请号: US14464658申请日: 2014-08-20
-
公开(公告)号: US09664608B2公开(公告)日: 2017-05-30
- 发明人: Wayne Frederick Reed , Michael Felix Drenski , Alex Wayne Reed
- 申请人: ADVANCED POLYMER MONITORING TECHNOLOGIES, INC.
- 申请人地址: US LA New Orleans US LA New Orleans
- 专利权人: ADVANCED POLYMER MONITORING TECHNOLOGIES, INC.,THE ADMINISTRATORS OF THE TULANE EDUCATIONAL FUND
- 当前专利权人: ADVANCED POLYMER MONITORING TECHNOLOGIES, INC.,THE ADMINISTRATORS OF THE TULANE EDUCATIONAL FUND
- 当前专利权人地址: US LA New Orleans US LA New Orleans
- 代理机构: Polsinelli PC
- 主分类号: G01N15/02
- IPC分类号: G01N15/02 ; G01N21/51 ; G01N21/75 ; G01N33/68 ; G01N21/53 ; G01N21/47
摘要:
Simultaneous Multiple Sample Light Scattering systems and methods can be used for polymer stability testing and for applying stressors to polymer or colloid solutions including heat stress, ultrasound, freeze/thaw cycles, shear stress and exposure to different substances and surfaces, among others, that create a polymer stress response used to characterize the polymer solution and stability.
公开/授权文献
- US20150056710A1 CHARACTERIZATION OF POLYMER AND COLLOID SOLUTIONS 公开/授权日:2015-02-26
信息查询