- 专利标题: Adsorption device for rotatable heating
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申请号: US13884440申请日: 2010-12-10
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公开(公告)号: US09666457B2公开(公告)日: 2017-05-30
- 发明人: Shaoyong Wang , Mingbo Wang
- 申请人: Shaoyong Wang , Mingbo Wang
- 申请人地址: CN Shenyang
- 专利权人: SHENYANG KINGSEMI CO., LTD.
- 当前专利权人: SHENYANG KINGSEMI CO., LTD.
- 当前专利权人地址: CN Shenyang
- 代理机构: Smith, Gambrell & Russell, LLP
- 优先权: CN201010555617 20101122
- 国际申请: PCT/CN2010/079664 WO 20101210
- 国际公布: WO2012/068751 WO 20120531
- 主分类号: H05B3/00
- IPC分类号: H05B3/00 ; H01L21/67 ; H01L21/687
摘要:
An adsorption device for rotatable heating is provided with an adsorption heating plate, a support needle driving device, a rotary sliding ring, and a turning shaft. The adsorption heating plate is amounted at the top of the turning shaft, and a wafer is arranged at the top of the adsorption heating plate. The rotary sliding ring is connected to the turning shaft in which a vacuum channel and a connection wire channel are arranged. Support needles are connected to the output end of the support needle driving device, run through the adsorption heating plate, and are arranged at the bottom of the wafer uniformly. The adsorption device incorporates the wafer adsorption function, the wafer rotating function with controllable speed, and the heating function for heating the wafer to reach different temperatures, thereby providing adsorption and heating rotation at the same time.
公开/授权文献
- US20130228563A1 ABSORPTION DEVICE FOR ROTATABLE HEATING 公开/授权日:2013-09-05
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