Invention Grant
- Patent Title: Semiconductor device
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Application No.: US14663140Application Date: 2015-03-19
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Publication No.: US09666664B2Publication Date: 2017-05-30
- Inventor: Ryo Kajitani , Tetsuzo Ueda , Yoshiharu Anda , Naohiro Tsurumi , Satoshi Nakazawa
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2012-217917 20120928
- Main IPC: H01L29/40
- IPC: H01L29/40 ; H01L29/06 ; H01L29/66 ; H01L29/778 ; H01L29/20 ; H01L29/205 ; H01L29/51 ; H01L29/78

Abstract:
An object is to achieve an increase in gain by reducing a current collapse, and reducing Cgd and Rg. A semiconductor device according to the present invention includes a substrate; a first semiconductor layer disposed on the substrate and made of a Group III nitride semiconductor; a second semiconductor layer disposed on the first semiconductor layer and made of a Group III nitride semiconductor; a gate electrode, a source electrode, and a drain electrode disposed on the second semiconductor layer; a first field plate electrode disposed on the second semiconductor layer; and a second field plate electrode disposed on the first field plate electrode, in which the first field plate electrode and the second field plate electrode are disposed between the gate electrode and the drain electrode.
Public/Granted literature
- US20150194483A1 SEMICONDUCTOR DEVICE Public/Granted day:2015-07-09
Information query
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