Invention Grant
- Patent Title: Semiconductor device
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Application No.: US14603632Application Date: 2015-01-23
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Publication No.: US09666722B2Publication Date: 2017-05-30
- Inventor: Daisuke Matsubayashi , Yoshiyuki Kobayashi , Shuhei Nagatsuka , Yutaka Shionoiri
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Fish & Richardson P.C.
- Priority: JP2014-013395 20140128; JP2014-120992 20140611; JP2014-161300 20140807; JP2014-209486 20141010
- Main IPC: H01L29/786
- IPC: H01L29/786

Abstract:
A transistor having favorable electrical characteristics. A transistor suitable for miniaturization. A transistor having a high switching speed. One embodiment of the present invention is a semiconductor device that includes a transistor. The transistor includes an oxide semiconductor, a gate electrode, and a gate insulator. The oxide semiconductor includes a first region in which the oxide semiconductor and the gate electrode overlap with each other with the gate insulator positioned therebetween. The transistor has a threshold voltage higher than 0 V and a switching speed lower than 100 nanoseconds.
Public/Granted literature
- US20150214378A1 SEMICONDUCTOR DEVICE Public/Granted day:2015-07-30
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