- 专利标题: Formation of connectors without UBM
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申请号: US14630265申请日: 2015-02-24
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公开(公告)号: US09673158B2公开(公告)日: 2017-06-06
- 发明人: Tsung-Ding Wang , Hung-Jen Lin , Chien-Hsun Lee
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Slater Matsil, LLP
- 主分类号: H01L23/00
- IPC分类号: H01L23/00 ; H01L21/56 ; H01L23/31 ; H01L23/29
摘要:
A device includes a substrate, a metal pad over the substrate, and a passivation layer having a portion over the metal pad. A post-passivation interconnect (PPI) is electrically coupled to the metal pad, wherein the PPI includes a portion over the metal pad and the passivation layer. A polymer layer is over the PPI. A solder ball is over the PPI. A compound includes a portion adjoining the solder ball and the polymer layer, wherein the compound includes flux and a polymer.
公开/授权文献
- US20150171037A1 Formation of Connectors without UBM 公开/授权日:2015-06-18
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