Invention Grant
- Patent Title: Target element types for process parameter metrology
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Application No.: US14795549Application Date: 2015-07-09
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Publication No.: US09678421B2Publication Date: 2017-06-13
- Inventor: Vladimir Levinski , Feler Yoel , Daniel Kandel
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G03F1/42
- IPC: G03F1/42 ; G06F17/50 ; G03F7/20 ; H01L21/66
Abstract:
Metrology targets, target design methods and metrology methods are provided. Metrology targets comprise target elements belonging to two or more target element types. Each target element type comprises unresolved features which offset specified production parameters to a specified extent and thus provide sensitivity monitoring and optimization tools for process parameters such as focus and dose.
Public/Granted literature
- US20150309402A1 TARGET ELEMENT TYPES FOR PROCESS PARAMETER METROLOGY Public/Granted day:2015-10-29
Information query
