Invention Grant
- Patent Title: Light emitting diode with quantum barrier doping
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Application No.: US14265371Application Date: 2014-04-30
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Publication No.: US09680051B2Publication Date: 2017-06-13
- Inventor: Yi-Keng Fu , Yu-Hsuan Lu
- Applicant: Industrial Technology Research Institute
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Priority: TW101106753A 20120301; TW101113026A 20120412; TW101137771A 20121012
- Main IPC: H01L33/06
- IPC: H01L33/06 ; H01L33/04

Abstract:
A light emitting diode including a substrate, a p-type and n-type semiconductor layers, an active layer, an interlayer, an electron barrier layer, a first and a second electrodes are provided. The n-type semiconductor layer is disposed on the sapphire substrate. The active layer has an active region with a defect density greater than or equal to 2×107/cm2. The active layer is disposed between the n-type and p-type semiconductor layers. The wavelength of light emitted by the active layer is λ, and 222 nm≦λ≦405 nm. The active layer includes i quantum barrier layers and (i−1) quantum wells, each quantum well is disposed between any two quantum barrier layers, and i≧2. N-type dopant is doped in at least k layers of the i quantum barrier layers, wherein k is a natural number and k≧1, when i even, k≧i/2, and when i is odd, k≧(i−1)/2.
Public/Granted literature
- US20140231747A1 LIGHT EMITTING DIODE Public/Granted day:2014-08-21
Information query
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