- 专利标题: Apparatus for heating and processing a substrate
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申请号: US14707025申请日: 2015-05-08
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公开(公告)号: US09685303B2公开(公告)日: 2017-06-20
- 发明人: Morgan D. Evans , Jason M. Schaller , D. Jeffrey Lischer , Ala Moradian
- 申请人: Varian Semiconductor Equipment Associates, Inc.
- 申请人地址: US MA Gloucester
- 专利权人: Varian Semiconductor Equipment Associates, Inc.
- 当前专利权人: Varian Semiconductor Equipment Associates, Inc.
- 当前专利权人地址: US MA Gloucester
- 代理机构: Nields, Lemack & Frame, LLC
- 主分类号: H01J37/317
- IPC分类号: H01J37/317 ; H01J37/20
摘要:
A system and method for heating a substrate while that substrate is being processed by an ion beam is disclosed. The system comprises two arrays of light emitting diodes (LEDs) disposed above and below the ion beam. The LEDs may be GaN or GaP LEDs, which emit light at a wavelength which is readily absorbed by silicon, thus efficiently and quickly heating the substrate. The LED arrays may be arranged so that the ion beam passes between the two LED arrays and strikes the substrate. As the substrate is translated relative to the ion beam, the LEDs from the LED arrays provide heating to the substrate.
公开/授权文献
- US20160329190A1 Apparatus For Heating And Processing A Substrate 公开/授权日:2016-11-10
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