- 专利标题： Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for forming resist underlayer film using the composition
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申请号： US15133808申请日： 2016-04-20
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公开(公告)号： US09695279B2公开(公告)日： 2017-07-04
- 发明人: Kwang Kuk Lee , Jin Su Ham , Sun Joo Kim , Hye Ryoung Lee , Min Ho Jung
- 申请人： SK Innovation Co., Ltd. , SK Global Chemical Co., Ltd.
- 申请人地址： KR Seoul KR Seoul
- 专利权人： SK Innovation Co., Ltd.,SK Global Chemical Co., Ltd.
- 当前专利权人： SK Innovation Co., Ltd.,SK Global Chemical Co., Ltd.
- 当前专利权人地址： KR Seoul KR Seoul
- 代理机构： The Webb Law Firm
- 优先权： KR10-2015-0056831 20150422
- 主分类号： C08G65/38
- IPC分类号： C08G65/38 ; C07C323/18 ; C07C39/17 ; C07C39/42 ; C07C43/225 ; C07C43/23 ; C09D171/00 ; G03F7/11 ; H01L21/027 ; G03F7/09
摘要：
Provided are a fluoreneol-based monomer, a polymer for preparing a resist underlayer film obtained therefrom, a resist underlayer film composition containing the polymer, and a method for forming a resist underlayer film using the resist underlayer film composition, wherein the fluoreneol-based monomer is represented by Chemical Formula 2 below:
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