- 专利标题: Substrate handling apparatus and lithographic apparatus
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申请号: US13582725申请日: 2011-03-14
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公开(公告)号: US09696633B2公开(公告)日: 2017-07-04
- 发明人: Johannes Onvlee , Robert-Han Munnig Schmidt
- 申请人: Johannes Onvlee , Robert-Han Munnig Schmidt
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 国际申请: PCT/EP2011/053810 WO 20110314
- 国际公布: WO2011/128162 WO 20111020
- 主分类号: G03B27/42
- IPC分类号: G03B27/42 ; G03B27/52 ; G03F7/20 ; B65H23/24
摘要:
A substrate handling apparatus for handling a substrate is disclosed. The substrate handling apparatus includes a substrate feeding device to feed the substrate towards an exposure area, a substrate receiving device to receive the substrate from the exposure area, and a substrate stabilization device to maintain, at least in the exposure area, the substrate substantially flat at an exposure height and/or tilt, the substrate stabilization device configured for contactless stabilization of the flexible substrate.
公开/授权文献
- US20130021593A1 SUBSTRATE HANDLING APPARATUS AND LITHOGRAPHIC APPARATUS 公开/授权日:2013-01-24
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