发明授权
- 专利标题: Method of cleaning substrate by ultraviolet rays with adjustable radiation energy
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申请号: US14381200申请日: 2014-06-12
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公开(公告)号: US09700921B2公开(公告)日: 2017-07-11
- 发明人: Jiangbo Yao
- 申请人: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- 申请人地址: CN Shenzhen, Guangdong
- 专利权人: Shenzhen China Star Optoelectronics Technology Co., Ltd
- 当前专利权人: Shenzhen China Star Optoelectronics Technology Co., Ltd
- 当前专利权人地址: CN Shenzhen, Guangdong
- 代理商 Andrew C. Cheng
- 优先权: CN201410216997 20140521
- 国际申请: PCT/CN2014/079708 WO 20140612
- 国际公布: WO2015/176336 WO 20151126
- 主分类号: B08B7/00
- IPC分类号: B08B7/00 ; B08B13/00 ; G02F1/1368 ; G02F1/13 ; G02F1/1333
摘要:
The present invention is related with a method of cleaning a substrate by ultraviolet rays with adjustable radiation energy, comprising steps of: providing an ultraviolet ray light (10) and a substrate (20) to be cleaned with the ultraviolet rays; locating several shading plates (30) between the ultraviolet ray light (10) and the substrate (20) to be cleaned with the ultraviolet rays; rotating the shading plates (30) to adjust an area of the substrate (20) irradiated with the ultraviolet rays emitted by the ultraviolet ray light (10) and thus to control the radiation energy on the substrate (20) in the unit time; cleaning the substrate (20) with the ultraviolet rays emitted by the ultraviolet ray light (10). With the method, the radiation energy of the ultraviolet rays for cleaning the substrate can be flexibly adjusted. The objectives of efficiently removing the organic matter stick on the surface of the substrate and preventing the static damage to the circuit pattern of the substrate can be achieved. Thus, the quality and the yield of the productions can be promoted.