Invention Grant
- Patent Title: Microresistor
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Application No.: US14864821Application Date: 2015-09-24
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Publication No.: US09704623B2Publication Date: 2017-07-11
- Inventor: Huang-Chou Chen , Ta-Wen Lo , Chun-Cheng Yao
- Applicant: CYNTEC CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: CYNTEC CO., LTD.
- Current Assignee: CYNTEC CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agent Winston Hsu
- Priority: TW104123186A 20150717
- Main IPC: H01C7/06
- IPC: H01C7/06 ; H01C1/14 ; H01C1/01

Abstract:
A micro-resistor includes a resistor material layer, an electrode set and a first protective layer. The electrode set includes a first electrode and a second electrode to define an opening which exposes the resistor material layer. A space between the first electrode and the second electrode represents an opening size. The first protective layer covers the opening completely and has a coverage size along a direction parallel with the space. The micro-resistor has a resistance of less than 5 milliohm and the difference of the opening size and the coverage size is less than 3100 micrometer to make the temperature coefficient of electrical resistance of the micro-resistor not greater than 150 ppm/° C.
Public/Granted literature
- US20170018340A1 MICRORESISTOR Public/Granted day:2017-01-19
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