Invention Grant
- Patent Title: Multi-layer large-format imprinting method
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Application No.: US14475934Application Date: 2014-09-03
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Publication No.: US09706654B2Publication Date: 2017-07-11
- Inventor: Ronald Steven Cok
- Applicant: Eastman Kodak Company
- Applicant Address: US NY Rochester
- Assignee: EASTMAN KODAK COMPANY
- Current Assignee: EASTMAN KODAK COMPANY
- Current Assignee Address: US NY Rochester
- Agent Raymond L. Owens; Kevin E. Spaulding
- Main IPC: H05K1/09
- IPC: H05K1/09 ; G02B5/20 ; G02B5/00 ; B29C35/08 ; B29C59/00 ; B29C59/02 ; G02F1/1335 ; H05K1/11 ; G03F7/00 ; B29K105/24 ; B29L31/34

Abstract:
A method of making a filled large-format imprinted structure includes providing a substrate, locating a first curable layer over the substrate, imprinting the first curable layer, and curing the first curable layer to form a first cured layer imprinted with a first micro-cavity having a first micro-cavity width less than or equal to 20 microns. A curable material is located in the first micro-cavity and cured to form cured material in the first micro-cavity. A second curable layer is located on the first cured layer and the first cured material, imprinted and cured to form a second cured layer imprinted with a second micro-cavity having a second micro-cavity width less than or equal to 20 microns. The curable material is located in the second micro-cavity and cured to form cured material in the second micro-cavity, thereby forming a large-format imprinted structure.
Public/Granted literature
- US20160062181A1 MULTI-LAYER LARGE-FORMAT IMPRINTING METHOD Public/Granted day:2016-03-03
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