Invention Grant
- Patent Title: Apparatus and method for measuring contamination of filter
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Application No.: US14712975Application Date: 2015-05-15
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Publication No.: US09709507B2Publication Date: 2017-07-18
- Inventor: Hyun Young Lee , Ji Woong Jang
- Applicant: RAYTRON Co., LTD
- Applicant Address: KR Daejeon
- Assignee: RAYTRON CO., LTD
- Current Assignee: RAYTRON CO., LTD
- Current Assignee Address: KR Daejeon
- Agency: Paratus Law Group, PLLC
- Priority: KR10-2014-0116761 20140903
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N21/94 ; B01D46/00 ; G01N21/25

Abstract:
Provided are an apparatus and method for measuring contamination of a filter. The filter contamination measuring apparatus includes a light-emitting unit which provides light having, a predetermined wavelength to a filter adsorbs foreign materials, a light-receiving unit which receives light reflected by the filter and convert reflected light information into a digital code to output, and a contamination calculating unit which processes the digital code provided by the light-receiving unit and calculates a degree of contamination of the filter, wherein the contamination calculating unit calculates a degree, in which a wavelength of the light reflected by the filter is shifted from the predetermined wavelength, compares intensity of light provided by the light-emitting unit with intensity of the light reflected by the filter, and calculates the degree of contamination of the filter.
Public/Granted literature
- US20160061747A1 APPARATUS AND METHOD FOR MEASURING CONTAMINATION OF FILTER Public/Granted day:2016-03-03
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