Invention Grant
- Patent Title: Curved RF electrode for improved Cmax
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Application No.: US15024931Application Date: 2014-09-24
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Publication No.: US09711290B2Publication Date: 2017-07-18
- Inventor: Mickael Renault , Vikram Joshi , Robertus Petrus Van Kampen , Thomas L. Maguire , Richard L. Knipe
- Applicant: CAVENDISH KINETICS, INC.
- Applicant Address: US CA San Jose
- Assignee: Cavendish Kinetics, Inc.
- Current Assignee: Cavendish Kinetics, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Patterson & Sheridan, LLP
- International Application: PCT/US2014/057220 WO 20140924
- International Announcement: WO2015/050761 WO 20150409
- Main IPC: H01L29/84
- IPC: H01L29/84 ; H01G5/16 ; H01H59/00 ; B81B3/00 ; B81C1/00 ; H01G5/011

Abstract:
The present invention generally relates to a MEMS device and a method of manufacture thereof. The RF electrode, and hence, the dielectric layer thereover, has a curved upper surface that substantially matches the contact area of the bottom surface of the movable plate. As such, the movable plate is able to have good contact with the dielectric layer and thus, good capacitance is achieved.
Public/Granted literature
- US20160240320A1 CURVED RF ELECTRODE FOR IMPROVED CMAX Public/Granted day:2016-08-18
Information query
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