- 专利标题: Patterning device, method of producing a marker on a substrate and device manufacturing method
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申请号: US14764522申请日: 2014-03-06
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公开(公告)号: US09726991B2公开(公告)日: 2017-08-08
- 发明人: Johannes Jacobus Matheus Baselmans , Franciscus Godefridus Casper Bijnen , Daniëlle Elisabeth Maria Palmen
- 申请人: ASML Netherlands B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 国际申请: PCT/EP2014/054340 WO 20140306
- 国际公布: WO2014/139855 WO 20140918
- 主分类号: G03F9/00
- IPC分类号: G03F9/00 ; G03F7/20 ; G03F1/42 ; G03F1/44
摘要:
A patterning device, for use in forming a marker on a substrate by optical projection, the patterning device including a marker pattern having a density profile that is periodic with a fundamental spatial frequency corresponding to a desired periodicity of the marker to be formed. The density profile is modulated (such as sinusoidally) so as to suppress one or more harmonics of the fundamental frequency, relative to a simple binary profile having the fundamental frequency.
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