Invention Grant
- Patent Title: Integrated WLUF and SOD process
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Application No.: US15146423Application Date: 2016-05-04
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Publication No.: US09728515B2Publication Date: 2017-08-08
- Inventor: Rubayat Mahmud , Saikumar Jayaraman , Sriram Muthukumar
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwegman Lundberg & Woessner, P.A.
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L23/31

Abstract:
This disclosure relates generally to a wafer having a plurality of semiconductor chips having a major surface, a metal contact positioned on one of the plurality of semiconductor chips and having a side surface and contact surface, the contact surface substantially parallel to the major surface, wherein the contact surface defines a thickness of the metal contact relative to the major surface, an underfill layer abutting the one of the plurality of semiconductor chips and the side surface of the metal contact, the underfill layer having a top surface substantially parallel to the major surface, wherein the top surface of the underfill layer defines a thickness of the underfill layer relative to the major surface, the thickness of the underfill layer being not greater than the thickness of the metal contact, and a solder bump formed in electrical contact with the contact surface of the metal contact.
Public/Granted literature
- US20160247774A1 INTEGRATED WLUF AND SOD PROCESS Public/Granted day:2016-08-25
Information query
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